Applications include: These materials offer an exciting alternative to graphene, as they possess a band gap, crucial for applications in electronics and photonics. They can also be used in chemical sensing applications as gas sensor devices produced in this manner display ultra-high sensitivities, down to 400 ppb for ammonia.

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Image: Photograph of MoS₂ films formed by sulfurisation of Mo films of different thickness on fused quartz (top) and SiO₂/Si (bottom) substrates. An increase in opacity with increasing starting film thickness is evident.

Applications include: Transparent displays, solar cells, hole injectors for OLED devices and transparent lighting.

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Image: Sample of transparent screen.

Mn₂Ga has a great potential to fill the need for recording densities up to 10 Tbit per square inch with 10  year thermal stability, and can be deposited with deposition equipment that is already available in  industrial facilities.

Applications include: Bit-patterned recording mediums, magnetic random access memories (MRAMs) and hard bias materials (actuators, transducers, etc.).

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Image: Current technology- continuous multi-grain media and future technology- bit-patterned media.

Applications include: High frequency resonators,ultrasensitive sensors: chemical, biological, motion, acceleration, portable power generation (Energy harvesting), imaging, transistors/switches,resonators for radio and microwave frequencies

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Image: Illustration of side view of NEMS device.

Applications include: High capacity data storage and applications where moderate amounts of storage with a need for very frequent updates are required.

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Image: Illustration of FRAMM.

Applications Include: Patterned metal plating/coating of thin layers for use in the semiconductor and coatings sectors.

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Image: Electrodeposited patterns achieved using magnet arrays. The arrays are a) square parallel, b) square alternating, c) hexagonal parallel and d) hexagonal alternating arrangements. Bottom row: More electrodeposits under different conditions. The magnet arrays are d) hexagonal pair-wise alternating, e) square alternating, f) hexagonal parallel and g) hexagonal alternating.

This facilitates a wide range of applications specific to diamond in a simple cost-efficient method for the first time.

Applications include: Patterning on a wide variety of substrates.

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Image: Schematic of diamond nano patterning process.

The technology is based upon two related things, firstly using modified polymers as hard masks and secondly, the assembly of block copolymers on hard mask materials.

Applications include: Bottom-up self-assembly of nano-scale structures. The main application of this technology lies within the manufacture of sub-16 nm logic circuitry (for computer processors) and copper Interconnects for memory devices.

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Image: Example of chemical process to produce self-assembled nano patterns.

Applications include: Electronic interconnects, light harvesting and bio sensors.

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Image: Schematic of nano wire growth process.

Applications include: Use in the semiconductor industry to fabricate devices which use germanium such as: transistors, optical devices and solar cells.

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Image: Cross-linking of the HSQ resist to the Ge crystal facilitates high-resolution EBL on Ge surfaces.

Applications include: Sensing, communications, optical devices, energy harvesting and enhanced light adsorption for solar technologies.

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Image: Image of nano helical structure manufactured in CRANN.

Applications include: Devices in the ICT sector or any high temperature electronics applications including; power semiconductor devices, switching devices, high temperature electronics and high frequency devices.

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Image: Schematic and semi-log I-V curve of the carbon/n-Si Schottky barrier diode.

Impairments to the signal incurred from the network such as chromatic dispersion, polarization mode dispersion, additional filtering, etc, will not influence the function of the module.

Applications include: Optical telecommunications. ONSR is a key parameter for future high speed and transparent optical networks.

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Image: OSNR is a key measure of the health of optical networks; particularly those used for optical telecommunications, and is a key parameter for future high speed and transparent optical networks.